Automated Mask alignment system, photolithography processes, cleanroom, Microelectronics and Microsystems Unit, CEIT(Center of Studies and Technical R

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Automated Mask alignment system, photolithography processes, cleanroom, Microelectronics and Microsystems Unit, CEIT(Center of Studies and Technical Research), University of Navarra, Donostia, Gipuzkoa, Basque Country, Spain

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Size: 5371px × 3581px
Photo credit: © Javier LARREA / Alamy / Afripics
License: Licensed
Model Released: Yes

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