Thin film surface chemical analysis of silicon wafer coating using X-Ray Photoelectron Spectrometer in a vacuum, UK

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A photoelectron beam is delivere from above onto a silicon wafer held in an electronically controlled robotic arm. The spectrometer on the left measures the thin film surface for quality control.

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Size: 3543px × 5315px
Location: English, United Kingdom, Europe, GB, England, Great Britain, UK
Photo credit: © NCP Images / Alamy / Afripics
License: Licensed
Model Released: No

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