. Metallographic etching reagents: I, for copper. roxide, themixture being one of the most widely used reagents for the etchingof copper. Fig. 7 illustrates the results obtained. By keepingthe ammonium hydroxide in excess, a plain uncontrasted etchingwas produced; when, after etching, the specimen was dipped foran instant into hydrogen peroxide, a pronounced film of oxideresulted, which was readily detected by the change in color of thesurface. There was, however, no selective oxidation by thismethod, and no contrast was produced, as shown by Fig. 7, details revealed by the previous etchi
. Metallographic etching reagents: I, for copper. roxide, themixture being one of the most widely used reagents for the etchingof copper. Fig. 7 illustrates the results obtained. By keepingthe ammonium hydroxide in excess, a plain uncontrasted etchingwas produced; when, after etching, the specimen was dipped foran instant into hydrogen peroxide, a pronounced film of oxideresulted, which was readily detected by the change in color of thesurface. There was, however, no selective oxidation by thismethod, and no contrast was produced, as shown by Fig. 7, details revealed by the previous etching (Fig. 7, a) are merelyobscured somewhat by the oxidation which occurred. If the relative proportions of ammonium hydroxide and hydro-gen peroxide are changed, however, so that the oxydizing agent isin considerable excess, selective oxidation of the various crystalssupplements the solvent action, and a contrast etching results. RawdonlLorentz J Metallographic Etching Reagents for Copper 653 Scientific Papers of the Bureau of Standards, Vol. 16. ^
Size: 1581px × 1581px
Photo credit: © Reading Room 2020 / Alamy / Afripics
License: Licensed
Model Released: No
Keywords: ., bookcentury1900, bookdecade1920, bookidmetallograph, bookyear1920
